The ELIT1.5 (Elliptical Implant Test) phantom has been developed to generate uniform exposure for implants in the MITS1.5 system and enables automated testing with DASY52NEO. ELIT1.5 allows the exposure of implants with long leads to constant amplitude and phase for worst-case RF exposure evaluation.

  • Description
The ELIT1.5 (Elliptical Implant Test) phantom has been developed to generate uniform exposure for implants in the MITS1.5 system and enables automated testing with DASY52NEO. ELIT1.5 allows the exposure of implants with long leads to constant amplitude and phase for worst-case RF exposure evaluation.

There are two modalities of the phantom: ELIT1.5 and H-ELIT1.5, which are used respectively in the vertical and horizontal modalities of the MITS1.5 system.The ELIT1.5 meets the specifications of the current ISO/IEC AIMD JWG Test Requirements.


Material Transparent Plexiglass (PMMA)
Liquid compatibility Compatible with sugar- and oil-based tissue simulating media.
  Not compatible with Triton or DGBE-based liquids.
Dimensions Length 600 mm; Height 400 mm; Width 90 mm
  Submerged depth of implant 65 mm
Wall thickness 11 mm
Racetrack material FR-4 Glass reinforced epoxy
Racetrack dimensions Length 459 mm; Height 270 mm
  Width x 1 track 2.1 mm; Width x 3 tracks 26.3 mm
  Track spacing 10mm
Amplitude and phase along top of racetrack   Etan 75 ± 5% of Emax
  Phase 0 ± 4°
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